Does Acid Etching Influence the Adhesion of Universal Adhesive Systems in Noncarious Cervical Lesions? A Systematic Review and Meta-analysis
To evaluate the adhesion of universal adhesive systems to the dentin of noncarious cervical lesions (NCCLs) by comparing the etch-and-rinse and self-etch strategies through a systematic review and meta-analysis. Systematic electronic searches were performed by two independent reviewers into the following databases: PubMed/MEDLINE, Scopus, Web of Science, and Cochrane Library until December of 2021. Only randomized clinical trials were selected, comparing etch-and-rinse and self-etch strategies and using universal adhesive systems in NCCLs. This systematic review was conducted according to the PRISMA guidelines and registered into PROSPERO. After the removal of duplicates, 170 articles were identified. In an initial screening of titles and abstracts, 146 records did not satisfy the inclusion criteria and were, therefore, excluded. Twenty-four studies were eligible for evaluation of the full text, and four were excluded after this step. Finally, 20 randomized clinical trials were included in this systematic review and meta-analysis. This systematic review and meta-analysis revealed that applying universal adhesive systems in the etch-and-rinse strategy could lead to better medium-term (>12 to 36 months) retention of NCCL restorations than the self-etch strategy, as well as resulting in lower percentages of marginal discoloration, marginal adaptation, and secondary caries. However, the use of a self-etching strategy can lead to lower postoperative sensitivity.SUMMARY
Objective:
Methods:
Results:
Conclusion:

Flow diagram of study. Reprinted from Moher D, Liberati A, Tetzlaff J, Altman DG, & the PRISMA Group (2009) Preferred reporting items for systematic reviews and meta-analyses: The PRISMA statement PLoS Medicine 6(7) e1000097. doi: 10.1371/journal.pmed1000097 http://www.prisma-statement.org. Used by permission.

Risk of bias.

Forest plot for retention. Abbreviations: ER, etch-and-rinse; SE, self-etch; M-H, Mantel-Haenszel.

Forest plot for marginal discoloration. Abbreviations: ER, etch-and-rinse; SE, self-etch; M-H, Mantel-Haenszel.

Forest plot for marginal adaptation. Abbreviations: ER, etch-and-rinse; SE, self-etch; M-H, Mantel-Haenszel.

Forest plot for secondary caries. Abbreviations: ER, etch-and-rinse; SE, self-etch; M-H, Mantel-Haenszel.

Forest plot for post operative sensitivity. Abbreviations: ER, etch-and-rinse; SE, self-etch; M-H, Mantel-Haenszel.
Contributor Notes